SBIR Phase I: Developing Energy-Efficient 3D Memory Using Advanced Indium Gallium Zinc Oxide Transistors for Next-Generation AI Chips

NSF Award Search · 01002526DB NSF RESEARCH & RELATED ACTIVIT · $304,994 · view on nsf.gov ↗

Abstract

The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase I project lies in addressing the urgent need for energy-efficient hardware to support the rapid growth of artificial intelligence (AI). As AI applications expand to devices like smartphones, wearables, and autonomous systems, the energy inefficiency of current hardware limits deployment. This project introduces a new type of ultra-dense memory, called 3D Gain-Cell Random Access Memory (GCRAM), built using a novel vertical transistor structure. By enabling computing and memory functions in the same location, this technology reduces energy losses and supports real-time, low-power AI processing. The innovation is projected to significantly exceed the energy efficiency of existing processors. This advancement may enable on-device AI that will improve privacy, responsiveness, and sustainability by reducing reliance on cloud infrastructure. The proposed technology has a clear commercial path through licensing to chip designers and foundries. By year three of production, the company aims to reach AI markets in mobile devices and robotics. This Small Business Innovation Research (SBIR) Phase I project focuses on developing a new three-transistor (3T) memory cell architecture using vertical indium gallium zinc oxide (IGZO) transistors fabricated via atomic layer deposition. This Back End of Line (BEOL)-compatible process enables high-density monolithic 3D integration, addressing the mem

Key facts

NSF award ID
2528261
Awardee
ATOMOS 3D LLC (IN)
SAM.gov UEI
CPYUZUHVWJH5
PI
Hao-Yu Lan
Primary program
01002526DB NSF RESEARCH & RELATED ACTIVIT
All programs
NANOTECHNOLOGY INITIATIVE
Estimated total
$304,994
Funds obligated
$304,994
Transaction type
Standard Grant
Period
10/01/2025 → 09/30/2026